Optimal Growth and Characterization of Cobalt Sulphide Thin Films Fabricated Using the Chemical Bath Deposition Technique

Donald N. Okoli, Cecilia N. Okoli

Abstract


In this work, chemical bath deposition technique was used to deposit thin films of cobalt sulphide on glass substrate from the aqueous solution containing 1M of cobalt chloride, 1M of thiourea, 1M of ammonia and 1M of ethylene diamine tetra acetate (EDTA) which served as the complexing agent. The optical measurement was carried out on the deposited films using M501 single beam scanning UV/visible spectrophotometer. The results show that the films have high absorbance towards the UV-region whereas it recorded low transmittance value in the same region. The films also exhibited poor reflectance value towards the UV-region. The band gap energy value was found to be 1.72eV. The films were observed to have thickness value range of 1.122µm to 1.152µm. These properties made the material to be a good candidate for photovoltaic and opto-electronic applications.

Keywords:Cobaltsulphide, absorbance, transmittance,reflectance, solid state property, band gap energy, thin film


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ISSN (Paper)2224-3186 ISSN (Online)2225-0921

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